Niobium Oxide Nb2O5 Target

Overview

Niobium Oxide Nb2O5 Target is widely used in sputtering coating, semiconductor, optics, tool coating and medical equipment due to its high melting point, strong corrosion resistance, excellent conductivity, biocompatibility, and adjustable film properties.

Advantages

  • High purity, low impurities, easy to process, good ductility, and plasticity.
  • High melting point, can maintain stable size and structure without deformation in a high-temperature sputtering environment.
  • Good electrical conductivity can quickly and evenly conduct current, improving the uniformity and density of thin film deposition.
  • High thermal conductivity helps to quickly dissipate heat, reduce local overheating of the target material, and extend service life.
  • Extremely low vapor pressure can avoid target material loss and film contamination caused by evaporation in a vacuum environment.
  • Strong corrosion resistance, no obvious toxicity, and good compatibility with human tissue.

Application

  1. Niobium Oxide Nb2O5 Target sputtered superconducting thin films can be used in quantum computing chips, high-sensitivity magnetic sensors, and other cutting-edge fields.
  2. As a Diffusion barrier material, niobium thin films can prevent the diffusion of metal ions in silicon-based devices, improve the reliability of devices, and be used in advanced integrated circuit processes.
  3. The gradient refractive index optical film can be prepared by the sputtering process, which is used for antireflection film, filter, and other optical elements.
  4. In the tool coating, the hard phase formed by the combination of niobium with carbon and nitrogen can significantly improve the wear resistance of the coating and prolong the tool life, which is suitable for high-speed cutting.
  5. The film prepared by Nb Target can be used for electrode coating of solid oxide fuel cells, and its high conductivity and resistance to molten salt corrosion can improve the efficiency and stability of the cell.
  6. In solar cells, Nb-doped oxide films can be used as transparent conductive layers with high light transmittance and conductivity, which can optimize the photoelectric conversion performance of solar cells.

Dimension

Material

Nb2O5

Purity

Nb≥99.95%

Density

4.47g/cm3

Size

Width:50-200mm

Length:100-500mm

Thickness

1-10mm

Melting Point

1512 °C

Surface

Polished, Black, Pickled, Alkaline washing

Shape

Plates, Step Targets

Certification

ISO9001

Process

Niobium Oxide Nb2O5 Target is a ceramic target material. Its preparation process is significantly different from that of metal targets (such as pure niobium targets) and must be achieved through powder metallurgy.

①Convert metal niobium powder into Nb₂O₅ powder, or generate Nb₂O₅ through the decomposition of niobium compounds.

②Make ingots through isostatic pressing or injection molding.

③Put in a vacuum furnace for high-temperature sintering to improve density and mechanical strength.

④Cutting and grinding to reduce surface roughness and avoid uneven discharge during sputtering.

⑤Comprehensive quality control and vacuum packaging.

Pictures

Nb2O5 Target Niobium Oxide Target